Papers - Fujimoto Toshiyuki

41. Gas-Phase Nucleation in the Tetraethylorthosilicate (TEOS)/O₃APCVD Process

    Okuyama K., Fujimoto T., Adachi M., and Hayashi T.，AIChE J.，vol.43，(p.2688 ～ 2697)，1997.06

    

42. Sintering of Polydisperse Nanometer-Sized Agglomerates

    Seto T., Hirota A., Fujimoto T., Shimada M., and Okuyama K.，Aerosol Sci. Technol.，vol.27，(p.422 ～ 438)，1997.03

    

43. Morphology Control of Films by Atmospheric-Pressure ChemicalVapor Deposition Using Tetraethylorthosilicate/Ozone System

    Adachi M., Okuyama K., Fujimoto T., Sato J., and Muroyama M.，Jpn. J. Appl. Phys. Pt. 1，vol.35，(p.4438 ～ 4443)，1996.05

    

44. Film Formation by a New Chemical Vapor Deposition Process Using Ionization of Tetraethylorthosilicate

    Adachi M., Okuyama K., and Fujimoto T.，Jpn. J. Appl. Phys. Pt. 2，vol.34，(p.L1148-L1150 ～ )，1995.08