国際会議Proceedings - 藤本　敏行

41. Particle Generation and Its Effectson Film Surface Morphology in TEOS/Oxygen Plasma Enhanced CVD Process

    M. Shimada, K. Okuyama, Y. Itoh, T. FujimotoandY. Fujishige，19thAnnual Conference of American Association of Aerosol Research，2000年11月，St. Louis

    

42. (Ba, Sr)TiO3 Thin Film Preparation by Liquid Chemical Vapor Deposition

    K. Okuyama, Y. Itoh, T. Fujimoto, T. Murakami, and F. G. Shi，2000 IAMS InternationalSeminar，2000年10月，Fukuoka

    

43. Preparation of (Ba, Sr)TiO3 Films Prepared byLiquid Chemical Vapor Deposition Method

    K. Okuyama, Y.Itoh, T. Fujimoto, T. Murakami, and F. G. Shi，The First Joint China /Japan Chemical Engineering Symposium，2000年09月，Beijing

    

44. Evaluation of ion and particle interaction in CVD Process

    K. Okuyama, M. Shimada, and T. Fujimoto，Proceedings of Symposium of Dry Process，(頁 245 ～ )，1999年11月，Tokyo

    

45. Measurement of Spatial Distribution of Submicron Particles by Two-Color Polarization-Sensitive Laser Light Scattering Method

    M. Shimada, K. Okuyama, T. Fujimoto, and Y. Fujishige，Proceeding of Vapor Phase Synthesis of Materials III，1999年

    

46. Effects of Preparation Conditions on the Characteristics of Titanium Dioxide Particles Produced by a CVD Method

    Okuyama, K., M. Shimada, T. Fujimoto, T. Maekawa, K. Nakaso, T. Seto，J. Aerosol Sci.，29巻，(頁 S907-S908 ～ )，1998年

    

47. Film Formation by a New CVD Process using Ionization of TEOS

    M. Adachi, T. Hayasi, T. Fujimoto, and K.Okuyama，CVD-XIV-EUROCVD11，(頁 116 ～ )，1997年09月，Paris

    

48. A New CVD Film Formation Process using Ionization of TEOS

    M. Adachi, T. Hayashi,T.Fujimoto, and K. Okuyama，Proceedings of ISSM '97，1997年，San Francisco, USA

    

49. Gas-Phase Nucleation an APCVD Film Formation Process using Tetraethylorthosilicate/Ozone System

    M. Adachi, K. Okuyama, and T. Fujimoto，5th WorldCong. Chem. Eng., Vol.IV，(頁 779 ～ 783)，1996年09月，San Diego